Redefining the Boundaries of Photonics Performance
Now introducing Selerion™: our family of organic electro-optic (OEO) materials for best-in-class modulator speed, power efficiency, and stability!
NLM’s hybrid OEO technology combines high-performance Selerion materials with modulation technology compatible with multiple integrated photonics platforms including silicon, silicon nitride, plasmonics, and others.
NLM’s hybrid OEO technology integrates Selerion materials and nanophotonic modulator architectures engineered for each other. Selerion hybrid OEO technology is designed to pack the highest performance in the smallest space, with devices built to maximize its extraordinary EO response.
Selerion OEO materials are a relative of EO polymer technology. Selerion is best represented by the groundbreaking Selerion-HTX material, our patented crosslinkable organic glass technology enables standard solution processing techniques and high thermal and photochemical stability for withstanding the demanding conditions in data centers and more.
Selerion-HTX is the first material in NLM’s Selerion family of hybrid OEO technologies.
Advantages of Selerion-HTX
Known as HLD in scientific literature, Selerion-HTX balances a high EO coefficient (r33) and index of refraction with unprecedented long-term temperature stability for a hybrid OEO material. Selerion-HTX is compatible with current silicon manufacturing lines, enabling fabs and OSATs to incorporate it at the back end of their process flows with minimal disruption.
SELERION-HTX FEATURES
- In situ crosslinking during processing to form a thermally stable, durable thermoset plastic.
- High EO performance in C and O bands
- EO Coefficient: 150 – 450 pm/V
- Index of refraction: 1.75 – 2.0 (wavelength dependent)
- Poling efficiency: 2 – 4 nm2/V2
- Thermal stability
- Long-term storage and operational stability in excess of 120°C.
- Projected t80 after initial burn-in of 11 years at 120°C long-term storage.
- Cryo-compatible.
Data from S. R. Hammond et al, Proc. SPIE 2022, doi: 10.1117/12.2622099
Continuing Our Innovation!
Our veteran technical team was trained and developed the groundwork for this technology as part of a 25-year development effort at the University of Washington. We continue to innovate with new materials, processes, and device architectures. Check out our scientific research publications for appearances in peer-reviewed journals and other publications. Learn about partnering with us.
